发明名称 DEVICE FOR CONTINUOUS FILM FORMING
摘要 FIELD: machine building. ^ SUBSTANCE: settling drums (2 and 3) of device are arranged opposite and parallel to each other to ensure padding S wound on them facing each drum. Elements 12 and 13 generate magnetic field converging plasma to surface of the drum facing gap 5 between the drums. The said elements are installed in each drum 2 and 3 for sedimentation. The device is equipped with source of plasma 14, polarity of which is alternately reversed between one electrode and another electrode. Pipe 8 supplies gas for formation of film into gap 5. The gap is vacuumised with a device for vacuumising. One electrode of source 14 of plasma feed is connected with one settling drum 2, while its another electrode is connected with another settling drum 3. ^ EFFECT: reduced sedimentation of film on internal part of vacuum chamber and prevention of film de-lamination. ^ 5 cl, 7 dwg
申请公布号 RU2417275(C1) 申请公布日期 2011.04.27
申请号 RU20090134196 申请日期 2008.01.15
申请人 KABUSIKI KAJSJA KOBE SEJKO SE 发明人 TAMAGAKI KHIROSI
分类号 C23C16/513;C23C16/54 主分类号 C23C16/513
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