| 摘要 |
Improved method to fabricate a microelectronic device provided with at least one circuit to detect biological elements, comprising the steps of: a) forming transistors, depositing at least one layer in at least one insulating material (141) coating said transistors, forming one or more holes (143) in said layer of insulating material (141), so as to expose the upper face of the respective gate (135) of first-type transistors, filling the holes with a gate material, b) removing, at least in part, the respective gate (135) of the first-type transistors, whilst the gate of second-type transistors is protected, the method prior to or at the same time as said removal conducted at step b) further comprising the removal of said gate material.
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