OPTICAL CHARACTERISTIC MEASURING METHOD AND DEVICE, AND EXPOSURE METHOD AND DEVICE

摘要

PROBLEM TO BE SOLVED: To measure optical characteristics of a projection optical system with high precision by simplifying the constitution of an optical system disposed on an image plane side of the projection optical system.

SOLUTION: A measuring device 20 which measures a wavefront aberration of the projection optical system PL includes: an introduction optical system 21 which is disposed on an object plane side of the projection optical system PL and guides a part of illumination light IL to the projection optical system PL; a micromirror 23 which is disposed on the image plane side of the projection optical system PL, and converts a part of illumination light IL having passed through the projection optical system PL into a spherical wave and returns it to the projection optical system PL; a light reception optical system 25 which shares a part of the introduction optical system 21 and extracts the light returned through the projection optical system PL as measurement light; and a wavefront measurement system 26 which receives the measurement light to measure the wavefront aberration of the projection optical system PL.

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