| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system that reduces uneven cooling of an object so that the object may be maintained at a substantially uniform temperature. <P>SOLUTION: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe configured to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber. <P>COPYRIGHT: (C)2011,JPO&INPIT |
