| 发明名称 |
Device manufacturing method with EUV radiation |
| 摘要 |
A source module for use in a lithographic apparatus is constructed to generate extreme ultra violet (EUV) and secondary radiation, and includes a buffer gas configured to cooperate with a source of the EUV radiation. The buffer gas has at least 50% transmission for the EUV radiation and at least 70% absorption for the secondary radiation. |
| 申请公布号 |
EP2300878(A1) |
申请公布日期 |
2011.03.30 |
| 申请号 |
EP20090780491 |
申请日期 |
2009.07.13 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
VAN HERPEN, MAARTEN;SOER, WOUTER;YAKUNIN, ANDREY |
| 分类号 |
G03F7/20;H05G2/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
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