发明名称 |
PATTERNING METHOD, DEVICE MANUFACTURING METHOD USING THE PATTERNING METHOD, AND DEVICE |
摘要 |
<p>Provided is a patterning method, wherein a donor substrate, in which a light-to-heat conversion layer and a division pattern are formed on a substrate and a transferring material exists within said division pattern, is opposed to a device substrate and said transferring material is transferred on the device substrate by irradiating the light-to-heatconversion layer with light so that at least a part of said transferring material and at least a part of said division pattern are simultaneouslyheated. The patterning method enables large size and highly accurate fine patterning without degrading characteristics of thin films such as organic EL materials.</p> |
申请公布号 |
EP2299784(A1) |
申请公布日期 |
2011.03.23 |
申请号 |
EP20090766604 |
申请日期 |
2009.06.15 |
申请人 |
TORAY INDUSTRIES, INC. |
发明人 |
FUJIMORI, SHIGEO;SHIRASAWA, NOBUHIKO;TANIMURA, YASUAKI |
分类号 |
H05B33/10;B41M5/26;B41M5/382;B41M5/46;B44C1/17;H01L21/336;H01L29/786;H01L51/00;H01L51/05;H01L51/40;H01L51/50 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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