发明名称 PATTERNING METHOD, DEVICE MANUFACTURING METHOD USING THE PATTERNING METHOD, AND DEVICE
摘要 <p>Provided is a patterning method, wherein a donor substrate, in which a light-to-heat conversion layer and a division pattern are formed on a substrate and a transferring material exists within said division pattern, is opposed to a device substrate and said transferring material is transferred on the device substrate by irradiating the light-to-heatconversion layer with light so that at least a part of said transferring material and at least a part of said division pattern are simultaneouslyheated. The patterning method enables large size and highly accurate fine patterning without degrading characteristics of thin films such as organic EL materials.</p>
申请公布号 EP2299784(A1) 申请公布日期 2011.03.23
申请号 EP20090766604 申请日期 2009.06.15
申请人 TORAY INDUSTRIES, INC. 发明人 FUJIMORI, SHIGEO;SHIRASAWA, NOBUHIKO;TANIMURA, YASUAKI
分类号 H05B33/10;B41M5/26;B41M5/382;B41M5/46;B44C1/17;H01L21/336;H01L29/786;H01L51/00;H01L51/05;H01L51/40;H01L51/50 主分类号 H05B33/10
代理机构 代理人
主权项
地址