发明名称 Semiconductor device
摘要 A semiconductor device includes a semiconductor layer of a first conductivity type; a deep well of a second conductivity type formed in a portion of an upper layer portion of the semiconductor layer; a well of the first conductivity type formed in a portion of an upper layer portion of the deep well; a source layer of the second conductivity type formed in the well; a drain layer of the second conductivity type formed in the well apart from the source layer; and a contact layer of the second conductivity type formed outside the well in an upper layer portion of the deep well and connected to the drain layer. The drain layer is electrically connected to the deep well via the well by applying a driving voltage between the source layer and the drain layer.
申请公布号 US7906808(B2) 申请公布日期 2011.03.15
申请号 US20090476147 申请日期 2009.06.01
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MATSUDAI TOMOKO;YASUHARA NORIO;NAKAMURA KAZUTOSHI
分类号 H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119 主分类号 H01L29/76
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