发明名称 |
Process for smoothing surface of glass substrate |
摘要 |
There is provided a process for smoothing a substrate surface having a concave defect, such as a pit or a scratch. A process for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography, comprising disposing a thin film on a glass substrate; detecting a concave defect existing on the glass substrate; and locally heating or locally anodizing a portion of the thin film just above the detected concave defect to perform a chemical reaction accompanied by a volume increase in a material forming the thin film.
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申请公布号 |
US7901843(B2) |
申请公布日期 |
2011.03.08 |
申请号 |
US20080122407 |
申请日期 |
2008.05.16 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
SUGIYAMA TAKASHI;IKUTA YOSHIAKI;ITO MASABUMI |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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