发明名称 Process for smoothing surface of glass substrate
摘要 There is provided a process for smoothing a substrate surface having a concave defect, such as a pit or a scratch. A process for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography, comprising disposing a thin film on a glass substrate; detecting a concave defect existing on the glass substrate; and locally heating or locally anodizing a portion of the thin film just above the detected concave defect to perform a chemical reaction accompanied by a volume increase in a material forming the thin film.
申请公布号 US7901843(B2) 申请公布日期 2011.03.08
申请号 US20080122407 申请日期 2008.05.16
申请人 ASAHI GLASS COMPANY, LIMITED 发明人 SUGIYAMA TAKASHI;IKUTA YOSHIAKI;ITO MASABUMI
分类号 G03F1/00 主分类号 G03F1/00
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