发明名称 ELECTRO-DEPOSITION FIXED ABRASIVE GRAIN WIRE AND CRYSTAL SLICING METHOD USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for reducing processing damage in slicing semiconductor crystals such as hard-brittle Ga-containing nitride crystal. <P>SOLUTION: First, a metal seat (400) to which a carbon seat (200) attached with a GaN crystal (100) and a grinding wheel (20) for truing is fixed is set in a cutting device for slicing crystals by a multi-wire saw (1). Next, an oscillation angle of the plate-shaped GaN crystal (100) during a cutting process is determined by oscillating a wire (10). The wire (10) is repeatedly oscillated so that the wire (10) travels toward a center from an end of the GaN crystal (100), and the cutting process proceeds by lifting the metal seat (400) using a lifting motor. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011031386(A) 申请公布日期 2011.02.17
申请号 JP20100146569 申请日期 2010.06.28
申请人 MITSUBISHI CHEMICALS CORP 发明人 KOSHIHATA MASANOBU;DOI NARIHIRO;UCHIDA HIROBUMI
分类号 B24D11/00;B24B27/06;B24B53/00;B24D3/00;B24D3/06;B28D5/04;H01L21/304 主分类号 B24D11/00
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