METHOD OF DEPOSITION OF METAL THIN FILM BY USING ATOMIC LAYER DEPOSITION,申请号KR20080075538-传众专利搜索

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发明名称	METHOD OF DEPOSITION OF METAL THIN FILM BY USING ATOMIC LAYER DEPOSITION
摘要
申请公布号	KR101013818(B1)	申请公布日期	2011.02.14
申请号	KR20080075538	申请日期	2008.08.01
申请人		发明人
分类号	H01L21/20	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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