发明名称 RESISTANCE VARIABLE NONVOLATILE MEMORY ELEMENT, AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a resistance variable nonvolatile memory element that is enhanced in integration and reducible in power consumption. SOLUTION: A memory element 10 has at least an electrode 2a and an electrode 2b arranged on a substrate 1, and has a nanowire structure 3, having a shell layer of a p-type semiconductor formed on an inorganic oxide nanowire of MgO etc., formed between the electrode 2a and electrode 2b. Thus, the shell layer of the p-type oxide semiconductor is formed on the inorganic oxide, accordingly a surface of the manufactured nanowire structure 3 is hard to be oxidized. The inorganic oxide forming the shell layer of the p-type semiconductor is NiO, CoO, CuO, Ta2O5, HfO2, etc. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011023651(A) 申请公布日期 2011.02.03
申请号 JP20090168919 申请日期 2009.07.17
申请人 OSAKA UNIV 发明人 YANAGIDA TAKESHI;KAWAI TOMOJI;NAGASHIMA KAZUKI;OKA KEISUKE
分类号 H01L27/10;C01F5/04;H01L45/00;H01L49/00 主分类号 H01L27/10
代理机构 代理人
主权项
地址