| 摘要 |
<p>Disclosed is a film-forming apparatus (10) which includes: a film-forming chamber (11), which has an upper part (22) in the gravitational direction, and has a substrate (W) disposed therein such that the substrate (W) surface, on which a film is to be formed, is parallel to the gravitational direction; an electrode unit (31), which has a flat-board-like cathode (75) having a voltage applied thereto, and an anode (67) disposed to face the cathode (75) by being spaced apart from the cathode, and which is removably provided in the film-forming chamber (11); and an attaching/detaching rail (41), which is provided on the upper part of the film-forming chamber (11), in the direction wherein the electrode unit (31) is drawn from the film-forming chamber (11), and which guides the electrode unit (31).</p> |
