发明名称 Methods for making electronic devices with a solution deposited gate dielectric
摘要 A method of making an electronic device comprises solution depositing a dielectric composition onto a substrate and polymerizing the dielectric composition to form a gate dielectric. The dielectric composition comprises a polymerizable resin and zirconium oxide nanoparticles.
申请公布号 US7879688(B2) 申请公布日期 2011.02.01
申请号 US20070771787 申请日期 2007.06.29
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 NOVACK JAMES C.;VOGEL DENNIS E.;NELSON BRIAN K.
分类号 H01L21/4763 主分类号 H01L21/4763
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