发明名称 LIGHT SHIELDING TRANSFER FILM, METHOD FOR PRODUCING THE SAME, AND METHOD FOR FORMING LIGHT SHIELDING PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a light shielding transfer film which enables low-temperature film formation and easily and inexpensively obtaining light shielding property by simple film transfer, a method for producing the same, and a method for forming a light shielding pattern using the same.SOLUTION: The light shielding transfer film is obtained by sequentially laying, on a temporary support, a light shielding thin film having a visible light transmittance of <1% and a negative photosensitive resin layer or a thermosetting resin layer. Alternatively, the light shielding transfer film is obtained by sequentially laying, on a temporary support, a positive photosensitive resin layer, a light shielding thin film layer having a visible light transmittance of <1%, and a negative photosensitive resin layer or thermosetting resin layer.
申请公布号 JP2011017975(A) 申请公布日期 2011.01.27
申请号 JP20090163731 申请日期 2009.07.10
申请人 HITACHI CHEM CO LTD 发明人 TSURUOKA YASUO;YOSHIDA TAKESHI;IWAMURO MITSUNORI
分类号 G03F1/00;G03F1/68;G03F7/004;G03F7/095;G03F7/11 主分类号 G03F1/00
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