发明名称 ELECTROPLATING METHOD AND APPARATUS
摘要 An apparatus and method is disclosed for simultaneously electroplating at least two parts in a series electrical configuration in an electroplating system using a shared electrolyte with excellent consistency in thickness profiles, coating weights and coating microstructure. Parts in high volume and at low capital and operating cost are produced as coatings or in free-standing form.
申请公布号 KR20110008043(A) 申请公布日期 2011.01.25
申请号 KR20107023293 申请日期 2009.03.04
申请人 INTEGRAN TECHNOLOGIES, INC. 发明人 TOMANTSCHGER KLAUS
分类号 C25D15/00;C25D13/00;C25D17/00 主分类号 C25D15/00
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