发明名称 WET ETCHING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a wet etching method having excelling operational efficiency and having a large selective range of materials for an etched board.SOLUTION: A glass board 1, including a patterned chromium layer 2 and a resist layer 3 on a surface, is immersed in an etchant 4 and wet-etched. Here, a metal bar 6 consisting of aluminum or iron is immersed in the etchant 4 in a tank 5, and the exposed surface 2a of the chromium layer 2 and the end of the metal bar 6 are brought into contact at a desired timing. The chromium layer 2, brought into contact with the metal bar 6, is etched gradually by an electrochemical reaction, or the like, and is miniaturized, while a part exposed to the etchant 4 of the glass board 1 is increased gradually and the part is wet-etched. Accordingly, the undercut shape of the glass board 1 is adjusted, and a tapered surface 7 is formed on the glass board 1. Quartz, white-board glass, blue-board glass, borosilicate glass, alkali-free glass or lead glass can applicable to the glass board 1.
申请公布号 JP2011014628(A) 申请公布日期 2011.01.20
申请号 JP20090155706 申请日期 2009.06.30
申请人 ULVAC SEIMAKU KK 发明人 ISHIZUKA MASAHIKO;HIRANO NAONORI
分类号 H01L21/306;C23F1/00;C23F1/16;H01L21/3205 主分类号 H01L21/306
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