发明名称 |
Near Non-Adaptive Virtual Metrology and Chamber Control |
摘要 |
Embodiments of the present invention relate to a method for a near non-adaptive virtual metrology for wafer processing control. In accordance with an embodiment of the present invention, a method for processing control comprises diagnosing a chamber of a processing tool that processes a wafer to identify a key chamber parameter, and controlling the chamber based on the key chamber parameter if the key chamber parameter can be controlled, or compensating a prediction model by changing to a secondary prediction model if the key chamber parameter cannot be sufficiently controlled. |
申请公布号 |
US2011009998(A1) |
申请公布日期 |
2011.01.13 |
申请号 |
US20100766626 |
申请日期 |
2010.04.23 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
WANG AMY;YU CHEN-HUA;WANG JEAN;LO HENRY;KO FRANCIS;LAI CHIH-WEI;ZUO KEWEI |
分类号 |
G05B13/04 |
主分类号 |
G05B13/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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