POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING POLYMERIC COMPOUND

摘要

PURPOSE: A positive type resist composition is provided to prevent defects in development and to suppress the elution of materials in immersion exposure. CONSTITUTION: A positive type resist composition includes: a fluorine-containing polymeric compound containing a component with dissolution property in an alkali developer as a block copolymerization part; a substrate component with increased solubility to the alkali developer by the action of acids; and an acid generator for generating acids by exposure.