| 摘要 |
PURPOSE: A method for forming a solar cell wafer electrode is provided to expose an emitter region of a solar cell wafer by removing SiNx and hydrophobic coating on an electrode region with laser. CONSTITUTION: A hydrophobic layer is coated on the surface of a solar cell wafer(S100). The hydrophobic layer is cured by a thermal process(S500). The hydrophobic layer and SiNx coated on an electrode region are removed. Conductive ink is sprayed according to a pattern. |
