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发明名称
ATOMIC LAYER DEPOSITION PROCESS
摘要
申请公布号
EP2222889(A4)
申请公布日期
2010.12.29
申请号
EP20080848424
申请日期
2008.10.30
申请人
HCF PARTNERS, L.P.
发明人
DAMERON, ARRELAINE
分类号
C23C16/00;C23C16/04
主分类号
C23C16/00
代理机构
代理人
主权项
地址
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