发明名称 PROTECTIVE APPARATUS, MASK, MASK FABRICATING METHOD AND CONVEYING APPARATUS, AND EXPOSURE APPARATUS
摘要 A protective apparatus that protects a predetermined area of the front surface of a mask substrate, provided with a pellicle frame that is disposed on at least a portion of the circumference of the predetermined area and bonded to the front surface of the mask substrate, and a pellicle that is mounted on the pellicle frame so as to cover an opening portion that is formed by the pellicle frame in a manner facing the predetermined area; in which the pellicle frame includes a first side portion and a second side portion, and a third side portion and a fourth side portion that are disposed at different positions along the predetermined area, and in relation to the normal direction of the front surface of the mask substrate, the rigidity of the first side portion and the second side portion is lower than the rigidity of the third side portion and the fourth side portion.
申请公布号 US2010323302(A1) 申请公布日期 2010.12.23
申请号 US20100766621 申请日期 2010.04.23
申请人 HANAZAKI NORITSUGU;SHIRATO AKINORI 发明人 HANAZAKI NORITSUGU;SHIRATO AKINORI
分类号 G03F7/20;B32B37/12;G03B27/52 主分类号 G03F7/20
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