发明名称 Gradient Ternary or Quaternary Multiple-Gate Transistor
摘要 An integrated circuit structure includes a semiconductor substrate; insulation regions over the semiconductor substrate; and an epitaxy region over the semiconductor substrate and having at least a portion in a space between the insulation regions. The epitaxy region includes a III-V compound semiconductor material. The epitaxy region also includes a lower portion and an upper portion over the lower portion. The lower portion and the semiconductor substrate have a first lattice mismatch. The upper portion and the semiconductor substrate have a second lattice mismatch different from the first lattice mismatch.
申请公布号 US2010301390(A1) 申请公布日期 2010.12.02
申请号 US20090616068 申请日期 2009.11.10
申请人 KO CHIH-HSIN;WANN CLEMENT HSINGJEN 发明人 KO CHIH-HSIN;WANN CLEMENT HSINGJEN
分类号 H01L31/0304 主分类号 H01L31/0304
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