| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for inexpensively and stably thinning film thickness of a metallic thin film of Ag or the like of a thin film laminated body showing successful electric conductivity. SOLUTION: The method comprises forming the metallic thin film whose principal component is at least one selected from a group consisting of Fe, Cu, Ag, W, Au, Pt on a base material using a sputtering method. The method includes the processes of: decompressing the inside of a vacuum chamber installed in a sputtering system; introducing gas containing Ar as atmospheric gas in the vacuum chamber after decompression; and supplying ion current to a sputtering target after introducing the gas, wherein a current value of the ion current is adjusted to be low by containing N<SB>2</SB>gas in the atmospheric gas. COPYRIGHT: (C)2011,JPO&INPIT
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