发明名称 RESIN SOLUTION FOR THERMAL IMPRINT, RESIN THIN FILM FOR THERMAL IMPRINT, METHODS FOR PRODUCTION OF THE RESIN SOLUTION AND THE RESIN THIN FILM
摘要 There are provided a resin solution substantially applicable to thermal imprinting, a thin film thereof, and manufacturing methods of those. A thermal imprinting resin solution for forming a thin film used for thermal imprinting applications comprises a thermoplastic resin and greater than or equal to at least one kind of solvent which can dissolve the resin, and an containing amount of foreign particles having a grain diameter larger than or equal to 0.2 µm is controlled to be less than 3000 particles/cm 3 . Moreover, remaining volatile compositions in a thin film are set to be less than or equal to 0.25 % when the thin film is formed from the thermal imprinting resin solution.
申请公布号 EP2174983(A4) 申请公布日期 2010.11.03
申请号 EP20080790129 申请日期 2008.07.02
申请人 MARUZEN PETROCHEMICAL CO., LTD.;SCIVAX CORPORATION 发明人 TAKAYA, YOSHIAKI;SATSUKA, TAKURO;NAGAI, GO;HAYASHIDA, YOSHIHISA;KUSUURA, TAKAHISA;MITRA, ANUPAM
分类号 C08L45/00;B05D1/40;B29C59/02;C08F32/00;C08K5/01 主分类号 C08L45/00
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