发明名称 RADIOSENSITIVE RESIN COMPOSITION, PARTITION FOR ORGANIC EL DISPLAY ELEMENT, INSULATING FILM, AND FORMING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiosensitive resin composition which has sufficient resolution, high resistance to a resist stripper or the like, excellent radiation sensitivity, and high light-shielding performance during heating. <P>SOLUTION: The radiosensitive resin composition for forming partitions and insulating films includes: [A] an alkali-soluble resin of a copolymer obtained by copolymerization of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride and (a2) a monomer containing a compound selected from a group of phenol skeleton-containing unsaturated compounds, bisphenol skeleton-containing compounds, and naphthalene skeleton-containing compounds; [B] a 1, 2-quinonediazide compound; and [C] a heat sensitive dye. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010237310(A) 申请公布日期 2010.10.21
申请号 JP20090083187 申请日期 2009.03.30
申请人 JSR CORP 发明人 HANAMURA MASAAKI;MARUYAMA TAKUYUKI
分类号 G03F7/023;G02B1/04;G03F7/004;G03F7/40;H01L51/50;H05B33/10;H05B33/12;H05B33/22 主分类号 G03F7/023
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