发明名称 BJT and method for fabricating the same
摘要 According to one embodiment, a collector electrode including metal is used for a sink region for connecting an n+ type buried layer, so that the sink region can be narrowly formed. Further, an interval between a base region and the collector electrode can be reduced, thereby considerably decreasing the size of the transistor. Furthermore, collector resistance is reduced, so that the performance of the transistor can be improved.
申请公布号 US7816763(B2) 申请公布日期 2010.10.19
申请号 US20070930592 申请日期 2007.10.31
申请人 DONGBU HITEK CO., LTD. 发明人 KIM NAM JOO
分类号 H01L23/48 主分类号 H01L23/48
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