发明名称 |
Exposure method and apparatus, and device producing method using two light beams to correct non-rotationally symmetric aberration |
摘要 |
An exposure method which includes illuminating a first object formed with a pattern to be transferred with a first light beam to expose a second object with the first light beam through the first object and a projection optical system; and irradiating the first object and at least one portion of the projection optical system with a second light beam having a wavelength range that is different from that of the first light beam to correct image forming characteristics of the projection optical system.
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申请公布号 |
US7817249(B2) |
申请公布日期 |
2010.10.19 |
申请号 |
US20060362817 |
申请日期 |
2006.02.28 |
申请人 |
NIKON CORPORATION |
发明人 |
UEHARA YUSAKU |
分类号 |
G03B27/54;G02B7/02;G03F7/20;H01L21/027 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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