| 摘要 |
PROBLEM TO BE SOLVED: To adjust in a vacuum so as to restrain a nozzle from moving, to obtain cluster ion beams of a stable and appropriate size distribution, and take a plenty of cluster ion beam current. SOLUTION: A skimmer 7 arranged between a cluster generating chamber 1 and a beam control part 2 is loaded through a plate 8 on an XY stage 10a, and a position of the skimmer 7 is adjusted with micrometers 10b, 10c. The micrometers 10b, 10c are arranged exposed outside a vacuum chamber 40, so that they 10b, 10c are operated with a vacuum degree of the vacuum chamber 40 retained. COPYRIGHT: (C)2011,JPO&INPIT |
