发明名称 |
SOLID-STATE IMAGING DEVICE, FABRICATION METHOD THEREOF, IMAGING APPARATUS, AND FABRICATION METHOD OF ANTI-REFLECTION STRUCTURE |
摘要 |
A fabrication method of an anti-reflection structure includes the steps of: forming a resin film having micro-particles dispersed therein on a surface of a substrate; forming a protrusion dummy pattern on the resin film by etching the resin film using the micro-particles in the resin film as a mask while gradually etching the micro-particles; and forming a protrusion pattern on the surface of the substrate by etching back the surface of the substrate together with the resin film having the protrusion dummy pattern formed thereon, and transferring a surface shape of the protrusion dummy pattern formed on a surface of the resin film to the surface of the substrate.
|
申请公布号 |
US2010244169(A1) |
申请公布日期 |
2010.09.30 |
申请号 |
US20100728448 |
申请日期 |
2010.03.22 |
申请人 |
SONY CORPORATION |
发明人 |
MAEDA KENSAKU;KOIKE KAORU;SASAKI TOHRU;TATSUMI TETSUYA |
分类号 |
H01L31/0236;H01L21/302;H01L31/0232;H01L31/18 |
主分类号 |
H01L31/0236 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|