发明名称 SOLID-STATE IMAGING DEVICE, FABRICATION METHOD THEREOF, IMAGING APPARATUS, AND FABRICATION METHOD OF ANTI-REFLECTION STRUCTURE
摘要 A fabrication method of an anti-reflection structure includes the steps of: forming a resin film having micro-particles dispersed therein on a surface of a substrate; forming a protrusion dummy pattern on the resin film by etching the resin film using the micro-particles in the resin film as a mask while gradually etching the micro-particles; and forming a protrusion pattern on the surface of the substrate by etching back the surface of the substrate together with the resin film having the protrusion dummy pattern formed thereon, and transferring a surface shape of the protrusion dummy pattern formed on a surface of the resin film to the surface of the substrate.
申请公布号 US2010244169(A1) 申请公布日期 2010.09.30
申请号 US20100728448 申请日期 2010.03.22
申请人 SONY CORPORATION 发明人 MAEDA KENSAKU;KOIKE KAORU;SASAKI TOHRU;TATSUMI TETSUYA
分类号 H01L31/0236;H01L21/302;H01L31/0232;H01L31/18 主分类号 H01L31/0236
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