发明名称 DEVICE FOR CLEANING MASK FOR ORGANIC EL, DEVICE FOR MANUFACTURING DISPLAY FOR ORGANIC EL, DISPLAY FOR ORGANIC EL, AND METHOD FOR CLEANING MASK FOR ORGANIC EL
摘要 PROBLEM TO BE SOLVED: To provide a device for cleaning a mask for an organic EL at a high degree to remove vapor-deposited materials therefrom while removing the vapor-deposited materials in the state that it has completely no contact with a substrate. SOLUTION: The device is provided for cleaning the mask for the organic EL to remove the vapor-deposited materials from the mask 1 for the organic EL. It includes a laser unit 13 for scanning laser light L on a region of all or part of the mask 1 for the organic EL, a suction nozzle 41 for sucking operation obliquely toward a site of scanning the laser light L, and a blow nozzle 42 for blowing operation from the opposite side to the suction nozzle 41 across the site of scanning the laser light L obliquely toward the site of scanning the laser light L. It also includes a nozzle moving part 15 for moving the suction nozzle 41 and the blow nozzle 42 following the site of scanning the laser light L. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010218932(A) 申请公布日期 2010.09.30
申请号 JP20090065481 申请日期 2009.03.18
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KATAGIRI KENJI;KAMEYAMA HIROKI;YUMIBA KENJI
分类号 H05B33/10;C23C14/04;H01L51/50 主分类号 H05B33/10
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