发明名称 |
DEVICE FOR CLEANING MASK FOR ORGANIC EL, DEVICE FOR MANUFACTURING DISPLAY FOR ORGANIC EL, DISPLAY FOR ORGANIC EL, AND METHOD FOR CLEANING MASK FOR ORGANIC EL |
摘要 |
PROBLEM TO BE SOLVED: To provide a device for cleaning a mask for an organic EL at a high degree to remove vapor-deposited materials therefrom while removing the vapor-deposited materials in the state that it has completely no contact with a substrate. SOLUTION: The device is provided for cleaning the mask for the organic EL to remove the vapor-deposited materials from the mask 1 for the organic EL. It includes a laser unit 13 for scanning laser light L on a region of all or part of the mask 1 for the organic EL, a suction nozzle 41 for sucking operation obliquely toward a site of scanning the laser light L, and a blow nozzle 42 for blowing operation from the opposite side to the suction nozzle 41 across the site of scanning the laser light L obliquely toward the site of scanning the laser light L. It also includes a nozzle moving part 15 for moving the suction nozzle 41 and the blow nozzle 42 following the site of scanning the laser light L. COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2010218932(A) |
申请公布日期 |
2010.09.30 |
申请号 |
JP20090065481 |
申请日期 |
2009.03.18 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
KATAGIRI KENJI;KAMEYAMA HIROKI;YUMIBA KENJI |
分类号 |
H05B33/10;C23C14/04;H01L51/50 |
主分类号 |
H05B33/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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