| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method properly performing exposure processing while maintaining a liquid in a desired state. <P>SOLUTION: In this exposure method for arranging a liquid LQ on a substrate P and irradiating the substrate P with an exposure light through the liquid LQ to expose the substrate P thereto, the concentration of an eluted substance in the liquid LQ arranged on the substrate P is set to satisfy a condition of R<SB>W</SB>-R<SB>P</SB>≤1.0×10<SP>-3</SP>, wherein R<SB>P</SB>is a transmittance per mm, in the optical path direction of the exposure light, of the liquid LQ containing the eluted substance eluted from the substrate P after the liquid LQ is arranged on the substrate P, and R<SB>w</SB>is transmittance of the liquid LQ per mm in the optical path direction of the exposure light before the eluted substance is eluted. <P>COPYRIGHT: (C)2010,JPO&INPIT |
