| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming apparatus and a pattern formation method with fewer failures in drawing a pattern due to level difference. SOLUTION: A controller 50 generates waveform correction data WRD having a drive signal correlated with each semiconductor chip based on level difference data HD showing a level difference between a reference height and a mounted height of a semiconductor chip and drive signal correction data having a level difference correlated with a correction amount of the drive signal. When the mounted height does not coincide with the reference height, signal correction processing takes place for correcting the drive signal COM based on the waveform correction data WRD, and a droplet is discharged while increasing and decreasing a volume of the droplet according to the level difference. COPYRIGHT: (C)2010,JPO&INPIT
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