METHOD FOR ROUGHENING SUBSTRATE SURFACE AND METHOD FOR MANUFACTURING PHOTOVOLTAIC DEVICE

摘要

A method for roughening a substrate surface, which comprises: a step of forming an opening (103) in a protective film (102) which is formed on the surface of a semiconductor substrate (101a); a step of forming a first recess (104) below the opening (103) and in the vicinity thereof by performing a first etching using an acid solution, while using the protective film (102) as a mask; a step of removing an oxide film (104a) which is formed on the surface of the first recess (104) by performing an etching, while using the protective film (102) as a mask; a step of forming a second recess (106) below the opening (103) and in the vicinity thereof by performing an anisotropic etching, while using the protective film (102) as a mask; and a step of removing the protective film (102).