| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask having a mask pattern for transferring a prescribed circuit pattern; and to provide a method for manufacturing the mask and a method for manufacturing a semiconductor device using the mask. <P>SOLUTION: Two rectangular aperture patterns 1, 2 are extracted, which are obliquely arranged to the X-axis and adjacent to each other on a X-Y plane. Then, the two rectangular aperture patterns 1, 2 thus extracted are each rotated by prescribed angles so that a pattern edge 1a, which corresponds to one side of one rectangular aperture pattern 1, and a pattern edge 2a, which corresponds to one side of the other rectangular aperture pattern 2, may face in parallel to each other. Then, optical proximity effect correction is made to each of the two rectangular aperture patterns 1, 2, which are each rotated by the prescribed angles, to form two corrected rectangular aperture patterns 3, 4. <P>COPYRIGHT: (C)2010,JPO&INPIT |
