| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a semiconductor optical integrated element which can be easily manufactured without highly accurate microfabrication. <P>SOLUTION: In the semiconductor optical integrated element, a lower clad layer 3, a lower core layer 4, an intermediate clad layer 5, an upper core layer 6 and an upper clad layer 7 are laminated in the order on a semiconductor substrate; the lower clad layer 3, the lower core layer 4, the intermediate clad layer 5, the upper core layer 6 and the upper clad layer 7 are formed over a first region, a second region and a third region; and the thickness D1 of the intermediate clad layer 5 in the first region and the third region is different from the thickness D2 of the intermediate clad layer 5 in the second region. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
