发明名称 |
Controlling processing of semiconductor wafers based upon end of line parameters |
摘要 |
A method and an apparatus for processing semiconductor wafer based upon end-of-line (EOL) parameters. A target end-of-line parameter relating to a semiconductor wafer is determined. An inline parameter relating to processing of the semiconductor wafer is controlled in response to the target end-of-line parameter using a controller. Controlling the inline parameter includes adjusting a target inline parameter that correlates to the inline parameter.
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申请公布号 |
US7797073(B1) |
申请公布日期 |
2010.09.14 |
申请号 |
US20020156541 |
申请日期 |
2002.05.28 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
PASADYN ALEXANDER J.;BODE CHRISTOPHER A. |
分类号 |
G06F19/00 |
主分类号 |
G06F19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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