发明名称 Electrical die contact structure and fabrication method
摘要 A semiconductor device of the invention includes an integrated circuit formed on a semiconductor substrate having first and second surfaces and a notch region along the edges. The first surface includes electrical contact pads electrically connected with the integrated circuit. The first surface of the semiconductor substrate includes a top protective layer that has a surface portion extending beyond the edges of the semiconductor substrate. The second surface of the semiconductor substrate includes a bottom protective layer with electrical connectors. The surface portion of the top protective layer includes electrical contact pads that are electrically interconnected with electrical contact pad extensions. The electrical contact pad extensions are interconnected with electrical connectors via a backside electrical connector that overlaps the electrical contact pad extensions forming a lap connection. Methods for constructing such devices and connections are also disclosed.
申请公布号 US7795126(B2) 申请公布日期 2010.09.14
申请号 US20080969756 申请日期 2008.01.04
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 PRABHU ASHOK;PATIL SADANAND R.;LEE SHAW WEI;OWENS ALEXANDER H.
分类号 H01L21/00;H01L21/44;H01L23/48;H01L23/482;H01L23/52;H01L29/04;H01L31/0216 主分类号 H01L21/00
代理机构 代理人
主权项
地址