发明名称 Profiling solid state samples
摘要 Methods and apparatus may operate to position a sample, including an imager lens surface, within a processing chamber. Further activities may include creating a layer of reactive material in proximity with the imager lens surface, and exciting a portion of the layer of reactive material in proximity with the imager lens surface to form chemical radicals. Additional activities may include removing a portion of the material in proximity to the excited portion of the imager lens surface to a predetermined level, and continuing the creating, exciting and removing actions until at least one of a plurality of stop criteria occurs.
申请公布号 US7791071(B2) 申请公布日期 2010.09.07
申请号 US20060503680 申请日期 2006.08.14
申请人 MICRON TECHNOLOGY, INC. 发明人 RUEGER NEAL R.;WILLIAMSON MARK J.;SANDHU GURTEJ S.;ARRINGTON JUSTIN R.
分类号 H01L23/58 主分类号 H01L23/58
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