| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for recovering copper from iron chloride etching waste liquid by which copper is recovered as copper usable for a copper plating solution. Ž<P>SOLUTION: Copper taken out from an iron chloride etching waste liquid is dipped into an ammonia aqueous solution with a prescribed concentration to produce a copper-ammonia complex liquid, and thereafter, oxygen is acted on the copper-ammonia complex liquid to produce copper oxide. As the copper taken out from the iron chloride etching waste liquid, the copper precipitated on the surface of an iron material by dipping the iron material into the iron chloride etching waste liquid, or the copper precipitated on the surface of a photocatalyst by charging the photocatalyst to the iron chloride etching waste liquid and irradiating the photocatalyst with the prescribed light, is used. The photocatalyst is charged to the iron chloride etching waste liquid and is dispersed, and the photocatalyst is irradiated with the prescribed light to thereby precipitate copper on the surface of the photocatalyst, and thereafter, the precipitated copper is separated away from the surface of the photocatalyst. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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