| 摘要 |
<p>PURPOSE: An oxymester compound of high sensitivity is provided to ensure photosensitivity, resolution, and high absorbance at 365 nm and 405 nm. CONSTITUTION: An oxymester compound is denoted by general formula I. A photopolymerization initiator contains the oxymester compound of general formula I. A photosensitive resin composition contains a polymerization compound with ethylene unsaturated binding and the photopolymerization initiator of general formula I.</p> |
