APPARATUS FOR IMPROVING GLOBAL FLATNESS OF PHOTOMASKS AND METHOD FOR USING THE SAME

摘要

PURPOSE: An equipment and the utilization method for improving the global flatness of photomask sanction the physical power in the surface of photomask. The global flatness of photomask is improved. CONSTITUTION: The vacuum port(250) for adsorbing photomask is arranged in the single-side of the attracting plates(200). The attracting plates comprises the photomask supporting guide arranged in outside. The photomask supporting part(400) comprises the support points for supporting photomask and the support arm(450) in which support points are arranged. In the pressing plate(300), the pressurized frame(350) for adding pressure is arranged in the single-side of photomask.