发明名称 METHOD AND APPARATUS FOR REFINING ARGON
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for refining argon which is suitable for obtaining argon of high purity in a high yield by using a PSA method. <P>SOLUTION: In the method for refining argon, a raw material gas G<SB>0</SB>is taken into a storage tank 10 and a mixed gas G<SB>1</SB>is supplied from the storage tank 10 toward adsorption towers 31A, 31B, 31C in which an adsorbent is filled up. And, the cycle containing an adsorption process and a desorption process is repeatedly performed in each adsorption tower. In the adsorption process, in the status that the insides of the towers are relatively high-pressure, gas G<SB>1</SB>is introduced into the adsorption towers and impurities in gas G<SB>1</SB>are adsorbed to the adsorbent, and gas G<SB>2</SB>enriched with argon is discharged from the adsorption towers. In the desorption process, the pressure inside the towers is lowered and impurities are desorbed from the adsorbent, and gas is discharged from the adsorption towers. The desorption process contains a first desorption process for discharging gas G<SB>5</SB>from the adsorption towers in the period from the beginning to the medium of the process and a second desorption process for discharging gas G<SB>6</SB>from the adsorption towers, and returns gas G<SB>5</SB>to the storage tank 10. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010180067(A) 申请公布日期 2010.08.19
申请号 JP20090022311 申请日期 2009.02.03
申请人 SUMITOMO SEIKA CHEM CO LTD 发明人 MIYAKE MASAKUNI;MATSUURA KOJI;SUMITA TOSHIHIKO
分类号 C01B23/00;B01D53/04 主分类号 C01B23/00
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