发明名称 Method for surface treatment of substrate and method for forming fine wiring
摘要 The present invention related to a method for surface treatment and a method for forming fine wiring and more particularly, to a method for surface treatment of a substrate, including: preparing a substrate on which a fine wiring is to be formed; and treating the surface of the substrate with a fluorine containing liquid having a low boiling point, and a method for forming fine wiring using the same method. According to the present invention, not only the spreading of ink droplets but also the deterioration of the interface adhesion is avoided.
申请公布号 US7776407(B2) 申请公布日期 2010.08.17
申请号 US20080081429 申请日期 2008.04.16
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 JUNG HYUN-CHUL;JOUNG JAE-WOO
分类号 H05H1/24 主分类号 H05H1/24
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