| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask preventing generation of variations in the height and width among projections for alignment control in the manufacture of a color filter having the projections for alignment control disposed thereon, even when the film thickness of color pixels of one color differs from pixels of another color, and to provide a method for manufacturing a color filter and a color filter. <P>SOLUTION: The photomask includes fine light-shielding films (gray tone portions) 54R, 54G, 54B patterned to correspond to formation of projections for alignment control, wherein the fine light-shielding film (gray tone portion) includes a stripe light-transmitting slit 56R, 56G, 56B in the center in the width direction of a stripe light-shielding film 55R, 55G, 55B. The width of the stripe light-shielding film ranges from 8 to 13 μm, while the width of the stripe light-transmitting slit ranges from 1.5 to 3.5 μm. <P>COPYRIGHT: (C)2010,JPO&INPIT |
