发明名称 GAS SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTRUING FACILITIES
摘要 A gas supply system includes a main gas supply line; a vent gas supply line; a plurality of gas supply mechanisms disposed in middle of both gas supply lines; a pressure type flow-rate control system disposed on an inlet side of the main gas supply line so a flow of carrier gas is supplied to the main gas supply line; a pressure control system disposed on an inlet side of the vent gas supply line, a carrier gas having a predetermined pressure is supplied to the vent gas supply line while the pressure control system performs a pressure adjustment, a gas pressure of the main gas supply line detected downstream from an orifice of the pressure type flow-rate control system and a gas pressure of the vent gas supply line are compared, and the gas pressure of the vent gas supply line is adjusted so a difference therebetween becomes zero.
申请公布号 US2010192854(A1) 申请公布日期 2010.08.05
申请号 US20080680159 申请日期 2008.07.17
申请人 FUJIKIN INCORPORATED 发明人 NISHINO KOUJI;DOHI RYOUSUKE;NAGASE MASAAKI;HIRATA KAORU;SUGITA KATSUYUKI;IKEDA NOBUKAZU
分类号 H01L51/40 主分类号 H01L51/40
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