| 摘要 |
PURPOSE: A radiation sensitive resin composition, an interlayer insulating film, and a method for forming the same are provided to obtain an uniform thickness of a film even when a slit coating method is used, to have high radiation sensitivity, and to form a good pattern even when optimal developing time is over passed. CONSTITUTION: A radiation sensitive resin composition comprises: an alkali soluble resin; a 1,2-quinonediazide compound; and copolymers of polymerizable unsaturated compounds including a compound which is marked by CH2=CR^1COO-C_α H_2α-C_βF_2β+1, a compound which is marked by CH2=CR^2COO-(C_γ H_2γ-O)_a-R^3, and an unsaturated compound having a functional group which is marked by chemical formula 1. |
