| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for refining a resin-dissolved solution, the method minimizing fine particles and dirt, etc., and significantly reducing the number of defects in a pattern. <P>SOLUTION: The method for refining the resin-dissolved solution including a step of bringing activated carbon and at least one additive selected from the group consisting of (A) a metal chloride, (B) a metal oxide, and (C) an ion exchange resin into contact with the resin-dissolved solution, a method for obtaining the resin-dissolved solution, and a method for producing a chemically amplified photoresist composition are provided. <P>COPYRIGHT: (C)2010,JPO&INPIT |
