| 发明名称 |
Self-shading electrodes for debris suppression in an EUV source |
| 摘要 |
A radiation source having self-shading electrodes is disclosed. Debris originating from the electrodes is reduced. The path from the electrodes to the EUV optics is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris.
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| 申请公布号 |
US7759663(B1) |
申请公布日期 |
2010.07.20 |
| 申请号 |
US20060634385 |
申请日期 |
2006.12.06 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;SOER WOUTER ANTHON |
| 分类号 |
H01J35/00 |
主分类号 |
H01J35/00 |
| 代理机构 |
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