发明名称 IMPRINT APPARATUS
摘要 <p>PURPOSE: An imprint apparatus is provided to pattern various functional patterns on a chemical layer of a substrate by bonding the substrate with a stamp with an imprint method. CONSTITUTION: A chamber unit(2) provides a chamber with a preset size. A loading unit(4) loads a substrate inside the chamber unit. A stamp(6) is arranged to face one side of the substrate of the loading unit and is bonded with an imprint method. A first separation unit(8) firstly separates the edge of the stamp bonded with the substrate from the substrate. A second separation unit secondly separates the remaining part of the stamp from the substrate.</p>
申请公布号 KR20100082628(A) 申请公布日期 2010.07.19
申请号 KR20090002006 申请日期 2009.01.09
申请人 DMS CO., LTD. 发明人 JUNG, CHANG HO;YANG, JAE YOUNG;LEE, JIN HYANG;KIM, DUCK SOO
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址