发明名称 |
METHOD OF ELECTRON BEAM EXPOSURE |
摘要 |
A method of electron beam exposure in which a plurality of sets of reference values for setting the conditions for electron beam exposure are found in relation to a plurality of sizing marks which are successively arrayed at positions in the vicinity of the pattern area of a specimen, and the exposure condition values corresponding to registration marks on the surface of the specimen are derived from these said reference values for setting the exposure conditions. |
申请公布号 |
DE3066694(D1) |
申请公布日期 |
1984.03.29 |
申请号 |
DE19803066694 |
申请日期 |
1980.07.25 |
申请人 |
FUJITSU LIMITED |
发明人 |
YAMASHITA, YOSHIMI;YAMAMOTO, SUMIO |
分类号 |
H01L21/027;G03F7/207;H01J37/304;H01L21/30;H01L23/544;(IPC1-7):01L21/263;01J3/26 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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